Cleaning and Wet Etching

A wet bench with cascade rinser is available in the ox/diff area for prefurnace cleaning. A Fluorocarbon Miniclassic B rinser/dryer capable of handling either 50 or 100 mm wafers is used for final drying. Two other wet benches with cascade rinsers are available in the photolithography area for wet etching operations.

Department of Electronics
Mackenzie Building 5170
1125 Colonel By Drive,
Ottawa, ON K1S 5B6

Tel: 613-520-5755 Fax: 613-520-5708


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