Rapid Thermal Processing

An A.G. Associates Heatpulse 210 incoherent lamp annealer with thermocouple temperature control is available for general use for annealing in Ar, N2 or O2 ambients. This system is intensively used for implant activation and rapid thermal silicidation. Wafer diameters up to 100 mm can be accomodated.

Department of Electronics
Mackenzie Building 5170
1125 Colonel By Drive,
Ottawa, ON K1S 5B6

Tel: 613-520-5755 Fax: 613-520-5708

Email: info@doe.carleton.ca

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