Photolithography

Lithography is carried out using a Karl-Suss MA6 mask aligner, which can accept substrates ranging from small fragments to 100 mm diameter wafers. 150 mm wafers could be accomodated by the simple addition of a larger chuck.

Using HPR504 positive resist, feature sizes as small as 0.8 µ have been printed using chrome masks. With masks produced in house at Carleton the useful minimum feature size is 2.5 µ, with 2.5 µ minimum spacing and level-to-level registration.

Department of Electronics
Mackenzie Building 5170
1125 Colonel By Drive,
Ottawa, ON K1S 5B6

Tel: 613-520-5755 Fax: 613-520-5708

Email: info@doe.carleton.ca

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